发明名称 Method and apparatus for detecting mark, exposure method and apparatus, and production method for device and device
摘要 In view of a specific area having a characteristic surface state in a mark-formed area or a surrounding area thereof, an area calculation unit (33) has a window having a dimension corresponding to the specific area scan the whole measurement area in order to obtain a quantity representing a surface state based on measured signals through the window, and then, by identifying a measured signal area corresponding to the specific area based on the quantity as a function of the window's position, extracts a measured signal area corresponding to the mark. And a position calculation unit (35) performs computation such as pattern-matching on the signal area extracted, thereby detecting the position of the mark accurately and quickly. <IMAGE>
申请公布号 AU5703900(A) 申请公布日期 2001.01.31
申请号 AU20000057039 申请日期 2000.06.28
申请人 NIKON CORPORATION 发明人 KOUJI YOSHIDA
分类号 G03F9/00 主分类号 G03F9/00
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