发明名称 Treatment apparatus in high and low temperature
摘要 Disclosed is a treatment apparatus in high and low temperature, which comprises a high temperature radiating part and a low temperature radiating part and treats an affected part rotatively. Both the high and the low temperature radiating parts are rotatable. The apparatus of the present invention further comprises a controller. A user can adjust with the controller the respective high and low temperature radiation period and rotation period.
申请公布号 AU4149000(A) 申请公布日期 2001.01.30
申请号 AU20000041490 申请日期 2000.04.18
申请人 JUNG-SUN YOON;HEE-SUN YOON 发明人 JUNG-SUN YOON;HEE-SUN YOON
分类号 A61F7/00;A61F7/02;A61N5/06 主分类号 A61F7/00
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