发明名称 |
Treatment apparatus in high and low temperature |
摘要 |
Disclosed is a treatment apparatus in high and low temperature, which comprises a high temperature radiating part and a low temperature radiating part and treats an affected part rotatively. Both the high and the low temperature radiating parts are rotatable. The apparatus of the present invention further comprises a controller. A user can adjust with the controller the respective high and low temperature radiation period and rotation period. |
申请公布号 |
AU4149000(A) |
申请公布日期 |
2001.01.30 |
申请号 |
AU20000041490 |
申请日期 |
2000.04.18 |
申请人 |
JUNG-SUN YOON;HEE-SUN YOON |
发明人 |
JUNG-SUN YOON;HEE-SUN YOON |
分类号 |
A61F7/00;A61F7/02;A61N5/06 |
主分类号 |
A61F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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