CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To improve dry etching resistance and to reduce chapping of a resist surface after dry etching by incorporating multifunctional epoxy compound and/or multifunctional vinyl ether compound into a composition. SOLUTION: A chemical amplification type resist composition contains a resin which becomes dissolvable in an alkali aqueous solution by an acid and an optical acid generating agent and further contains the multifunctional epoxy compound and/or multifunctional vinyl ether compound. The multifunctional epoxy compound and the multifunctional vinyl ether compound are compounds respectively having two or more epoxy groups or vinyl ether groups in a molecule and are used as a crosslinking agent. The resin which becomes dissolvable in the alkali aqueous solution by the acid includes a monomer unit having an alicyclic skeleton and a monomer unit having a lactone skeleton. The monomer unit having the alicyclic skeleton is selected from cyclohexyl (meth)acrylate or the like and the monomer unit having the lactone skeleton is selected from (meth)acrylate having a δ-valerolactone ring or the like.