发明名称 Apparatus for filling a gap between spaced layers of a semiconductor
摘要 A semiconductor device assembly with a gap to be filled has thermal vias formed in the supporting substrate. After the semiconductor device is connected to the substrate and fill material positioned about the gap to create a seal, a vacuum is drawn through the thermal vias and a pressure applied to the fill material to urge the fill material into the interior of the gap.
申请公布号 US6179598(B1) 申请公布日期 2001.01.30
申请号 US19980208679 申请日期 1998.12.10
申请人 MICRON TECHNOLOGY, INC. 发明人 BRAND J. MICHAEL
分类号 B29C70/72;F28F7/00;H01L21/20;H01L21/44;H01L21/4763;H01L21/48;H01L21/50;H01L21/56;H01L23/44;H01L23/48;H01L29/40;(IPC1-7):H01L21/56 主分类号 B29C70/72
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