| 摘要 |
The present invention relates generally to a new apparatus and method for forming non-planar surfaces in substrates. More particularly, the invention encompasses an apparatus and a method for fabricating non-planar surfaces in semiconductor substrates wherein at least one zero compression set pad, such as a closed cell porous pad in combination with at least one elastic pad is placed over the non-planar surface prior to lamination and is caused to conform to the contour of the non-planar surface, thus preventing collapse of, or damage to, the non-planar features, such as, shelves or corners during the lamination process. After the lamination process, the zero compression set pad are conveniently removed from the non-planar surface area without causing any damage to the non-planar surface features, such as, shelves or corners or having any paste pull-outs. These zero compression set pads can be reused multiple number of times to form these MLC cavity substrates or similar other structures or features.
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