Method of monitoring target/component consumption for dual use titanium/titanium nitride sputtering

摘要

In the monitoring of the consumption of a target of, for example, titanium for providing titanium and/or titanium nitride film, the process work in kilowatt-hours (Y1) is determined for complete consumption of the target when providing only titanium, and the process work in kilowatt-hours (Y2) is also determined for complete consumption of the target in providing only titanium nitride. The target life is then determined in accordance with the formula;where:Y2 and Y1 are defined as above;W2=actual titanium nitride process work;W1=actual titanium process work;