发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor material of superior electrical characteristics, especially one formed into a films. SOLUTION: An insulating coat 102 is formed on a substrate 101 through gas phase reaction, and a semiconductor coat 103 is formed on the insulating coat 102, with the semiconductor coat 103 being formed into an island form, which is heated at 600-1,000 deg.C so that the insulating coat is contracted for providing a semiconductor device having superior electrical characteristics.
申请公布号 JP2001028341(A) 申请公布日期 2001.01.30
申请号 JP20000191506 申请日期 2000.06.26
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;TAKEMURA YASUHIKO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
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