发明名称 DEVICE FOR MANUFACTURING MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To form a hard carbon film on a surface of even an insulating substrate by placing the substrate, disposing a grid electrode, each in a reaction chamber adjacent to a plasma generating chamber and impressing negative bias voltage to the grid electrode. SOLUTION: Gas consisting essentially of hydrocarbon gas is introduced to a plasma generating chamber (cavity) 2 within a plasma CVD device through a gas flow controller 6 and a gas introducing pipe 5. And a magnetic field is impressed to the gas through an electromagnetic coil 10 and aμ-wave is introduced from aμ-wave power source through aμ-wave waveguide 4 and an insulating window 7 to the gas. Plasma is generated in the plasma generating chamber 2 by electronic cyclotron resonance. A substrate 11 and a grid electrode 12 are provided within a vacuum vessel 1 adjacent to the plasma generating chamber 2 and a bias voltage is impressed on the grid electrode 12 from a power source 13. Ions in the plasma generated are accelerated by the grid electrode 12 and go through a grid of the grid electrode and collide against the substrate to accumulate on the substrate.
申请公布号 JP2001028120(A) 申请公布日期 2001.01.30
申请号 JP20000125601 申请日期 2000.04.26
申请人 FUJI ELECTRIC CO LTD 发明人 MATSUYAMA HIDEAKI;NISHIMURA MEGUMI;NAGAYAMA TOSHIE
分类号 C23C16/27;C23C16/511;G11B5/84;(IPC1-7):G11B5/84 主分类号 C23C16/27
代理机构 代理人
主权项
地址