发明名称 |
DEVICE FOR MANUFACTURING MAGNETIC RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To form a hard carbon film on a surface of even an insulating substrate by placing the substrate, disposing a grid electrode, each in a reaction chamber adjacent to a plasma generating chamber and impressing negative bias voltage to the grid electrode. SOLUTION: Gas consisting essentially of hydrocarbon gas is introduced to a plasma generating chamber (cavity) 2 within a plasma CVD device through a gas flow controller 6 and a gas introducing pipe 5. And a magnetic field is impressed to the gas through an electromagnetic coil 10 and aμ-wave is introduced from aμ-wave power source through aμ-wave waveguide 4 and an insulating window 7 to the gas. Plasma is generated in the plasma generating chamber 2 by electronic cyclotron resonance. A substrate 11 and a grid electrode 12 are provided within a vacuum vessel 1 adjacent to the plasma generating chamber 2 and a bias voltage is impressed on the grid electrode 12 from a power source 13. Ions in the plasma generated are accelerated by the grid electrode 12 and go through a grid of the grid electrode and collide against the substrate to accumulate on the substrate.
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申请公布号 |
JP2001028120(A) |
申请公布日期 |
2001.01.30 |
申请号 |
JP20000125601 |
申请日期 |
2000.04.26 |
申请人 |
FUJI ELECTRIC CO LTD |
发明人 |
MATSUYAMA HIDEAKI;NISHIMURA MEGUMI;NAGAYAMA TOSHIE |
分类号 |
C23C16/27;C23C16/511;G11B5/84;(IPC1-7):G11B5/84 |
主分类号 |
C23C16/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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