发明名称 PURIFICATION OF SHIKIMIC ACID
摘要 PROBLEM TO BE SOLVED: To purify shikimic acid in high yield and high purity by putting a solution containing shikimic acid under a basic condition to dehydrate dehydroshikimic acid as an impurity and isomerize the resultant product to protocatechuic acid, or the like. SOLUTION: Shikimic acid is purified by putting a solution containing shikimic acid under a basic condition preferably at >=pH 8, more preferably >=pH 10. The solution containing the shikimic acid is, for instance, an aqueous solution produced by a chemosynthesis or a synthesis from quinic acid, a cultured product or culture solution produced by fermentation, or the treated product thereof. The method for putting the solution under the basic condition comprises preferably using an aqueous metal hydroxide solution (e.g. an aqueous sodium hydroxide solution) to prepare the basic condition, more preferably contacting the solution with a basic anion exchange resin and adsorbing shikimic acid to the basic anion exchange resin followed by eluting the shikimic acid with a basic aqueous solution.
申请公布号 JP2001026567(A) 申请公布日期 2001.01.30
申请号 JP19990187553 申请日期 1999.07.01
申请人 TORAY IND INC 发明人 SASAKI SATOSHI;SHIRAI MAKOTO;SAKAMOTO KOSUKE;YAHANDA SABUROU;SHIBAYAMA KATSUHIRO
分类号 C12P7/42;C07C51/47;C07C51/50;C07C62/34;(IPC1-7):C07C51/50 主分类号 C12P7/42
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