| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealing device which allows uniform processings by irradiating of stable laser light on a work. SOLUTION: A laser light Al from a laser light source 10 is shielded appropriately with a shutter device 40, so that during the period of the initial laser oscillations where energy fluctuation is large, no laser light Al is incident on the surface of a work W. Thus, the laser light AL of stable energy is supplied to the surface of work W at a required timing. At the alignment of irradiation regions on the work W to an irradiation optical system 20, a process stage device 33 is operated in stepping manner, however normally during the stepping operation, no laser light AL is emitted to stop the oscillation of the laser light source 10. Thus, the unnecessary operations of the laser light source 10 is reduced in number to prevent power loss, while degradation of a device is being suppressed.
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