EXPOSURE MASK, EXPOSURE METHOD, AND MANUFACTURE OF EXPOSURE MASK

摘要

PROBLEM TO BE SOLVED: To provide an exposure mask for pattern exposure/transfer in lump at a high resolution, regardless of the pattern size on the mask. SOLUTION: A transmissive film pattern 4 is formed on a film, which has transmission for exposure light, and a plurality of absorbing body materials 5 and 6 are embedded in the pattern recessed part. Unwanted parts are removed through chemical and mechanical polishing process or etching process for planarization, thus providing a mask as an exposure mask which is used as various lithography masks. With the exposure mask, pattern exposure/transfer at a high resolution is allowed, regardless of the pattern size.