发明名称 |
Apparatus and method for controlling plasma uniformity across a substrate |
摘要 |
A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity.
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申请公布号 |
US6179973(B1) |
申请公布日期 |
2001.01.30 |
申请号 |
US19990345466 |
申请日期 |
1999.06.30 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
LAI KWOK F.;NORDQUIST ANDREW L.;ASHTIANI KAIHAN A.;HARTSOUGH LARRY D.;LEVY KARL B. |
分类号 |
H01J37/34;(IPC1-7):C23C14/34;C23C14/35 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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