| 摘要 |
An alkaline developing solution for a radiation sensitive composition, which has no undissolved products even when the concentration of a pigment contained in a radiation sensitive composition is high, which does not cause such problems as scum, the residue after development and re-adhesion, and which can form pixels having a sharp pattern edge.The alkaline developing solution for a radiation sensitive composition is an aqueous solution which contains (A-1) at least one inorganic alkaline compound and (A-2) at least one organic alkaline compound selected from the group consisting of alkanolamines and alkylamines or which contains the above component (A-1), the above component (A-2) and (B) at least one nonionic surfactant selected from the group consisting of etherified polyoxyethylenes and etherified polyoxyethylene-polyoxypropylene block copolymers.
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