| 摘要 |
PURPOSE: An integral wave-guide is provided for an integrator used for electromagnetic radiation of a wavelength 50 nm or shorter, for improved even cross-sectional strength distribution of a projection beam before hitting a mask of a lithography projection apparatus used for manufacturing ICs, etc. CONSTITUTION: An integrator (10) comprising two pairs of parallel mirrors (11 and 12), which comprise such metals as Mo, W, Ru, Al, and their alloy, forms a hollow waveguide is provided on the path of a projection beam PB of radiation coming from a radiation system LA. Selection of metals depends on the wavelength used for the integrator, for W being optimum at 13.4 nm, Ru allowable at 11.4 nm, and Al desirable for 40 nm. Due to the internal reflection of the integrator, evenness in intensity at its outlet end is increased.
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