发明名称 CONTACT PROBE AND PROBE DEVICE
摘要 PROBLEM TO BE SOLVED: To increase the scrubbing amount of a contact pin to a pad without damaging the passivation. SOLUTION: A contact face is formed by diagonally polishing the tip of the lower surface of a contact pin 32a projecting from the film of a contact probe. The base end side of the contact face on the lower surface is cut away to form a recess 45 to form the contact pin 32a into a U-shape on side view. A raised face 45a at the front end of the recess 45 becomes approximately parallel to the tip 42a. Thus, the recess 45 is located in a position opposite to a passivation 26A during scrubbing of a pad 18a, so that the amount of scrubbing amount can be increased.
申请公布号 JP2001021586(A) 申请公布日期 2001.01.26
申请号 JP19990189759 申请日期 1999.07.02
申请人 MITSUBISHI MATERIALS CORP 发明人 ISHII TOSHINORI;SUGIYAMA TATSUO;IWAMOTO TAKAFUMI;YOSHIDA HIDEAKI;MASUDA AKIHIRO
分类号 G01R1/073;(IPC1-7):G01R1/073 主分类号 G01R1/073
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