发明名称 |
CONTACT PROBE AND PROBE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To increase the scrubbing amount of a contact pin to a pad without damaging the passivation. SOLUTION: A contact face is formed by diagonally polishing the tip of the lower surface of a contact pin 32a projecting from the film of a contact probe. The base end side of the contact face on the lower surface is cut away to form a recess 45 to form the contact pin 32a into a U-shape on side view. A raised face 45a at the front end of the recess 45 becomes approximately parallel to the tip 42a. Thus, the recess 45 is located in a position opposite to a passivation 26A during scrubbing of a pad 18a, so that the amount of scrubbing amount can be increased.
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申请公布号 |
JP2001021586(A) |
申请公布日期 |
2001.01.26 |
申请号 |
JP19990189759 |
申请日期 |
1999.07.02 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
ISHII TOSHINORI;SUGIYAMA TATSUO;IWAMOTO TAKAFUMI;YOSHIDA HIDEAKI;MASUDA AKIHIRO |
分类号 |
G01R1/073;(IPC1-7):G01R1/073 |
主分类号 |
G01R1/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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