| 摘要 |
<p>PROBLEM TO BE SOLVED: To select an adhesive which can transmit UV used as a light source for exposure in lithography with slight absorption, does not cause deterioration and degradation due to light and is excellent in adhesive power and to obtain a pellicle for lithography stably usable over a long period of time by tightly bonding a pellicle film to a pellicle frame with the adhesive. SOLUTION: A pellicle film is bonded to at least the top of a pellicle frame with, an adhesive having >=90%/μm light transmittance in the wavelength region of 190-800 nm and >=93%/μm light transmittance in the wavelength region of 240-600 nm to obtain the objective pellicle for lithography.</p> |
