| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mechanism for mounting a work to be treated which allows the space to be reduced by shortening the vertical stroke of a wafer chuck, without enlarging a wafer chuck (mounting mechanism). SOLUTION: A wafer chuck 10 comprises a reversibly rotatable chuck table 11, three transfer pins 12 vertically movable from its mounting surface 11A to be a reference, a support 13 for supporting the transfer pins 12 vertically movable, a lifting drive mechanism 14 for moving the support 13 together with the chuck table 11, and push-up rods 15B cooperating with it to cause the pins 12 to protrude out, the support 13 has notches 13C for avoiding the actions of the push-up rods 15B, depending on the rotating position of the chuck table 11.</p> |
