发明名称 ABRASIVE MATERIAL FOR CMP
摘要 <p>PROBLEM TO BE SOLVED: To reduce the sedimentation or aggregation of abrasive fine particles and the clogging of an abrasive cloth due to the abrasive fine articles as much as possible, by using an oxidizing agent and colloidal silica composition obtained by an reaction between an aqueous solution of quaternary ammonium hydroxide and silicic acid ester or a silica. SOLUTION: Colloidal silica composition used for this case is obtained by an reaction between an aqueous solution of quaternary ammonium hydroxide and a silicic acid ester or silica. Preferably, the concentration of the quaternary ammonium hydroxide is 1-25 wt.%, the concentration of the SiO2 is 1-30 wt.%, and pH value is 9 or more, preferably within the range of 10-13. As an oxidizing agent used in combination with the colloidal silica composition, from the view of obtaining an abrasive agent which is free from metal ion, it is preferable to use hydrogen peroxide, hypochlorous or ozone. More preferably, hydrogen peroxide, whose normal concentration is 0.5-10 wt.%, more preferably, 1-5 wt.%.</p>
申请公布号 JP2001023938(A) 申请公布日期 2001.01.26
申请号 JP19990192935 申请日期 1999.07.07
申请人 TAMA KAGAKU KOGYO KK 发明人 CHIYOU SHIYUNREN;ASO TOSHIAKI
分类号 B24B37/00;C09K3/14;C09K13/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 B24B37/00
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