发明名称 METHOD FOR FORMING SURFACE-TREATED OXIDE CONDUCTIVE THIN FILM AND PHOTOVOLTAIC ELEMENT USING THIN FILM
摘要 PROBLEM TO BE SOLVED: To establish a method to quickly and stably form an oxide conductive thin film subjected to a surface treatment having an excellent light confining effect. SOLUTION: An oxide conductive thin film is formed by an electrodeposition method on a base board 111 and an etching source is in gasified condition introduced into a processing vessel 109 for etching so that an etching gas atmosphere 110 is formed, and the surface of the oxide thin film is exposed to the atmosphere 110 to undergo an etching process, and the etched surface is subjected to dry etching.
申请公布号 JP2001023458(A) 申请公布日期 2001.01.26
申请号 JP19990192510 申请日期 1999.07.07
申请人 CANON INC 发明人 NISHIO YUTAKA
分类号 H01B13/00;C23F4/00;(IPC1-7):H01B13/00 主分类号 H01B13/00
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