发明名称 SUBSTRATE ROTATING AND DRYING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate rotating and drying device capable of reducing particles adhering to the substrate and drying the substrate under a high degree of cleanliness. SOLUTION: This device is constructed such that a tank evacuating damper is opened after a predetermined time elapses upon closing a chamber opening or closing lid 18. In this case, in order to release the held state of a clamped substrate and a holding state of a holder 19, the tank evacuating damper is opened just after closing the chamber opening/closing lid 18, after an elapse of a period of time when air-tightness is unstable during the course of deformation of a resilient packing 14 installed to perform an air-tight closure of the chamber opening or closing lid 18 to an attitude for air-tight closure.
申请公布号 JP2001021267(A) 申请公布日期 2001.01.26
申请号 JP19990196849 申请日期 1999.07.12
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 ARAKI HIROYUKI;YAGI AKIO
分类号 H01L21/304;F26B5/08;F26B11/14;F26B21/14;(IPC1-7):F26B11/14 主分类号 H01L21/304
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