发明名称 MANAGEMENT SYSTEM OF SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 <p>PURPOSE: To obtain a management system capable of analyzing the cause of outbreak of failures, while stably operating a semiconductor manufacturing line. CONSTITUTION: A sensor 1 is provided in each of manufacturing apparatus in a semiconductor production line and collects management information at all times. The collected management information as time series measurement pattern is compared with a pre-registered set value pattern in a deciding device 6. Consequently, if the deviation in the measurement pattern from the set value pattern is detected from the result in the deciding device 6, an instruction generator 8 indicates the occurrence of the abnormality, and instructs adjustment in the sequence of the production apparatus, so as to cancel the deviation of the measurement pattern from the set value pattern.</p>
申请公布号 KR20010006807(A) 申请公布日期 2001.01.26
申请号 KR20000013144 申请日期 2000.03.15
申请人 SHARP CORP 发明人 TAMAKI MAKOTO
分类号 H01L21/205;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):H01L21/00 主分类号 H01L21/205
代理机构 代理人
主权项
地址