| 摘要 |
PROBLEM TO BE SOLVED: To obtain a thin film magnetic head and its manufacturing method which enable track width restricting grooves which is formed, particularly, in an insulating layer to be formed so as to reach surely a lower core layer, and hence enable the magnetic pole layer to be properly grown by plating in the groove and recording characteristics to be improved. SOLUTION: A stopper layer 15 which has an etching rate smaller than the etching rate of an insulating layer 11 for reactive ion etching is formed between a lower core layer 10 and the insulating layer 11. With this constitution, a groove 11a which can securely reach a lower core layer 10 can be formed in the insulating layer 11. A lower magnetic pole layer 12 can be properly made to grown by plating in the groove 11a.
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