| 摘要 |
PROBLEM TO BE SOLVED: To extract a sampling pattern having reduced distortion with a single operation by judging the sampling pitch of a sampling mask according to the number of masks of the sampling mask and generating simultaneously a normalized pattern obtained by sampling a pattern original image and the sampling pattern. SOLUTION: The vertical and horizontal lengths are judged by means of an input pattern (ST1), and the number of masks of a sampling mask is judged (ST2). The sampling pitch of the sampling mask is judged according to the length and the normalized size of the input pattern and the number of masks of the sampling mask (ST3). A normalized pattern is generated from the OR of every sampling mask and also a sampling pattern is generated from every sampling mask from the value to which the value obtained by multiplying the value contained in every sampling mask by the weight value is added (ST4, 5).
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