| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a mask, an aligner, and an electron beam dimensional drift correction method, where a variable forming electron beam drawing system can be corrected on the dimensional drift of a forming beam without lowering the aligner in throughput. SOLUTION: An aligner is equipped with an electron beam dimensional drift correction opening 3B, provided over a second opening A and an electron detector 5 installed under the electron beam dimensional drift correction opening 3B, the volume of an electron beam passing through the electron beam dimensional drift correction opening 3B, while a pattern drawn is detected on real time basis, an upper deflector 4A is given a feedback related to an amount of deflection corresponding to the change in the quantity of electricity detected by the electron detector 5, with which a forming beam can be corrected on a dimensional drift real time in an exposure process.</p> |
