| 摘要 |
PROBLEM TO BE SOLVED: To form a high resolution resist pattern without lowering sensitivity by incorporating a specified compound. SOLUTION: The photosensitive composition contains a compound of the formula, wherein Y is a substituent such as alkyl, aryl or a heterocyclic group and X is a group of atoms including one or plural heteroatoms in the linked chain and required to form a ring together with the adjacent N and the adjacent C of earbonyl. The heteroatom may be N, O, S or Se, is preferably N, O or S and is further preferably N or O from the viewpoint of sensitivity. The plural heteroatoms may be the same or different. |
