发明名称 ALIGNMENT DEVICE, SUBSTRATE TO BE EXPOSED AND ALIGNMENT MARK IN ALIGNER
摘要 PROBLEM TO BE SOLVED: To realize accurate alignment by setting the assembly of plural marks as a 2nd alignment mark provided on the side of an object to be exposed. SOLUTION: The mark 10 put on a substrate is constituted of plural unit marks 11 having a center O. The unit marks 11 are arranged in various kinds of shape and have only to have the center O. Various kinds of shape such as a circle, a square and a triangle are considered as the shape of the mark 11. The mark 11 is formed one by one by a laser-viahole system. By combining plural marks 11 in such a way, the mark 10 having the optional shape and optional size is formed by the laser-viahole system. Therefore, the mark is formed in the case of forming the viahole of plural-layer substrate, and a processing stage is made efficient. Even when one part of the mark 10 is missed, it does not influence the accuracy of the mark 10 as a whole.
申请公布号 JP2001022098(A) 申请公布日期 2001.01.26
申请号 JP19990194463 申请日期 1999.07.08
申请人 ADTEC ENGINEENG CO LTD 发明人 GYODA MICHITOMO
分类号 H05K3/00;G03F9/00;(IPC1-7):G03F9/00 主分类号 H05K3/00
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