SAMPLE INSPECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To shorten the inspection time at the time of inspecting a wafer to be inspected by using a scanning electron microscope(SEM) by impressing different identification frequencies upon charged particle beams at every beam passing port. SOLUTION: An SEM 1 is provided with a lens barrel 56, a multifield emission electron gun F11, and an acceleration electrode F12. The SFM 1 is also provided with an X-deflector F17 and a Y-deflector F18 which deflect an electron beam in the X- and Y-axis directions, a beam reducing lens F19 which converges the electron beam on a wafer W to be inspected, etc. A beam identification frequency impressing member PL2 impresses different identification frequencies upon charged particle beams which pass through the beam passing ports of identification frequency impressing substrates 114 and 116. Therefore, the rays emitted from a plurality of beam-irradiated portions of the surface of the wafer W can be detected separately. Since the rays emitted from a plurality of beam-irradiated portions of the surface of the wafer W can be detected at once, the inspection speed is improved.