| 发明名称 |
METHODS FOR PRODUCING HIGHLY PURE SILICON DIOXIDE GLASS AND BURNER FOR CARRYING OUT THIS METHOD |
| 摘要 |
The invention relates to a method for producing pure silicon dioxide. According to this method, SiCl4 is heated with a burner (4) and converted into silicon dioxide and HCl. The SiCl4 (3) is heated with a premixing (11) H2-O2 burner (4). |
| 申请公布号 |
WO0105719(A1) |
申请公布日期 |
2001.01.25 |
| 申请号 |
WO2000EP06657 |
申请日期 |
2000.07.12 |
| 申请人 |
LINDE GAS AKTIENGESELLSCHAFT;SCHOENE, HOLGER |
发明人 |
SCHOENE, HOLGER |
| 分类号 |
C03B19/10;C03B19/14;C03B37/014;F23D14/32 |
主分类号 |
C03B19/10 |
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