Method of depositing thin film of metal oxide by magnetron sputtering apparatus

摘要

A method of depositing a thin film of metal oxide (4, 4a) by a magnetron sputtering apparatus with a mobile magnet (16) for creating a magnetic field reciprocating across a film deposition region, is characterized in that the magnet (16) reciprocates no more than twice in depositing a single thin film of metal oxide (4, 4a).