发明名称 OXIMSULFONSÄUREESTER UND DEREN VERWENDUNG ALS LATENTE SULFONSÄUREN
摘要 <p>Oximesulphonic acid esters of formula (Ib) are new. [R1''-(C=O)m-C(R2'')=N-O-SO2]x-R3'' (Ib) m = 0 or 1; x = 1 or 2; R1'' = phenyl substituted by one or more 1-6C alkyl, phenyl, OR4, SR4 and/or NR5R6 groups; or is naphthyl, anthracyl, phenanthryl or heteroaryl (each optionally substituted), provided that unsubstituted thienyl is excluded; R2'' = a group as defined for R1'', phenyl, 1-6C alkanoyl, benzoyl (optionally substituted), 2-6C alkoxycarbonyl, phenoxycarbonyl, NR5R6, morpholino, piperidino, CN, 1-4C haloalkyl, 1-6C alkyl-S(O)n, 6-12C aryl-S(O)n (optionally substituted), 1-6C alkyl-OSO2, 6-10C aryl-OSO2 or NHCONH2; or R1'' + R2'' = optionally benzo-fused 5- or 6-membered ring (optionally substituted); n = 1 or 2; R3'' = (i) 1-18C alkyl, phenyl(1-3C)alkyl, camphoryl, 1-10C haloalkyl, phenyl, anthracyl or phenanthryl (the aromatic radicals being optionally substituted), provided that when R3'' is phenyl, 3-chlorophenyl or 4-methylphenyl, R1 as methoxy-substituted phenyl must contain at least one more substituent (excluding methoxy or methyl) on the ring, and provided that no 2 substituents OR4 form a 1,3-dioxolan ring, when x is 1; or (ii) 2-12C alkylene, or optionally 1-12C alkyl-substituted phenylene, naphthylene, -1,4-phenylene-CH2-1,4-phenylene-, diphenylene or oxydiphenylene, when x is 2; R4 = H, 1-12C alkyl (optionally substituted); R5, R6 = H or 1-12C alkyl (optionally substituted), phenyl, 1-6C alkanoyl, benzoyl, 1-6C alkylsulphonyl, phenylsulphonyl, 4-methylphenylsulphonyl, naphthylsulphonyl, anthracylsulphonyl or phenanthrylsulphonyl; or R5 + R6 = a 5-7 membered ring optionally interrupted by O or NR4; R7 = 1-12C alkyl optionally substituted by OH and/or 1-4C alkoxy and optionally interrupted by O. Also claimed are: (1) a photoactivatable composition which comprises: (a) at least one compound crosslinkable under the action of an acid; and/or (b) at least one compound having a solubility which is altered under the action of an acid; and (c) at least one photoinitiator of formula (I); [R1-(C=O)m-C(R2)=N-O-SO2]x-R3 (I) R1 = a group as defined for R1'', provided that when R1 is methoxy-substituted phenyl at least one more substituent is present on the phenyl ring; R2 = a group as defined for R2'' or cyanophenyl; R3 = a group as defined for R3'', where the proviso does not hold; R4 = as above, and may additionally be phenyl; (2) the use of an oximesulphonic acid ester (Ia) as a photosensitive acid donor for radiation at wavelengths over 390 nm (Ia) is as formula (Ib) but the provisos given for R1'' and R3 do not hold; (3) a method of crosslinking compounds as in (a) above which comprises adding (I) and irradiating image-wise or over the whole area with light of wavelength 180-600 nm; (4) a photoresist for radiation at wavelengths over 390 nm using (I), (Ia) or (Ib) as photosensitive acid donor; and (5) a chemically amplified positive resist comprising (I), (Ia) or (Ib) as photosensitive acid donor.</p>
申请公布号 AT407157(B) 申请公布日期 2001.01.25
申请号 AT19960001905 申请日期 1996.10.30
申请人 CIBA SPEZIALITAETENCHEMIE HOLDING AG (CIBA SPECIALITES CHIMIQUES HOLDING SA) (CIBA SPECIALTY CHEMICALS HOLDING INC.) 发明人
分类号 A61K6/00;C07C309/64;C07C309/66;C07C309/72;C07C309/73;C07C309/75;C07C323/62;C07C381/00;C07D311/18;C08F2/46;C08F2/50;C09D11/03;C09D11/101;C09D161/20;C09D161/28;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):C08K5/42;C07C309/63;C07C251/62;C08J3/24;C08J3/28 主分类号 A61K6/00
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