EXPOSURE METHOD AND DEVICE THEREFOR

摘要

An exposure method and device therefor, which can enhance a throughput at exposing by enabling patterns to be transferred onto a wide area on an object to be exposed without substantially upsizing a projection system. Electron beams (EB) shot from an electron gun (1) are shone on transfer-receiving character patterns on a mask (M) via a field-of-vision-selecting deflector (7), the electron beams passed through the character patterns are deflected back by a deflector (25) and then applied onto a wafer (W) via a projection system (PL). The projection system (PL) is supported so as to be displaceable by a drive system (34) in a direction perpendicular to an optical axis, and the projection system (PL) is mechanically displaced or vibrated when the reduced images of character patterns respectively corresponding to a plurality of positions on the wafer (W) are to be transferred.