发明名称 |
Method for magnetron sputtering |
摘要 |
A method of depositing a thin film of metal oxide (4, 4a) by a magnetron sputtering apparatus with a mobile magnet (16) for creating a magnetic field reciprocating across a film deposition region, is characterized in that the magnet (16) reciprocates no more than twice in depositing a single thin film of metal oxide (4, 4a). <IMAGE> |
申请公布号 |
EP1070767(A1) |
申请公布日期 |
2001.01.24 |
申请号 |
EP20000300578 |
申请日期 |
2000.01.26 |
申请人 |
KANEKA CORPORATION |
发明人 |
SUZUKI, TAKAYUKI;NISHIO, HITOSHI |
分类号 |
H01L21/203;C23C14/08;C23C14/35;H01J37/34 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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