发明名称 Multi-layer semiconductor devices with stress-relief profiles
摘要 Multi-layer, semiconductor devices are configured to reduce stress by the removal of much of the structure which does not actually contribute to device performance. In one embodiment, trough between mesas which define light emitting facets in a laser diode bar are etched well into the substrate to remove all layers of different compositions there. In another embodiment, troughs are also etched in the backside of the substrate of a laser diode structure where the troughs are aligned along axes perpendicular to the axes of the mesas. The removal of stress permits more accurate alignment of the multiple facets along a single axis when the laser bar is bonded to a heat sink. The accurate alignment minimizes the placement constraints on the position of a microlens for achieving maximum power output and coupling efficiency for optical fibers coupled to the microlens.
申请公布号 US6178189(B1) 申请公布日期 2001.01.23
申请号 US19990304441 申请日期 1999.05.03
申请人 OPTO POWER CORPORATION 发明人 SRINIVASAN SWAMINATHAN;PATEL RUSHIKESH M.
分类号 H01S5/02;H01S5/32;H01S5/40;(IPC1-7):H01S5/024;H01S5/026 主分类号 H01S5/02
代理机构 代理人
主权项
地址