发明名称 METHOD AND APPARATUS FOR REMOVING FOREIGN MATTER DURING WASHING OF WAFER
摘要 PROBLEM TO BE SOLVED: To collect fine foreign matter and to reduce pressure loss by charging an electrode to which corrosion-resistant treatment is applied in a washing soln. and applying potential different in polariity from the zeta potential of foreign matter varied by the pH value of the washing soln. to the electrode to draw foreign matter to the electrode by the attraction due to this potential. SOLUTION: In a foreign matter removing apparatus 10, a filter 32 for collecting foreign matter is arranged in a conductive cylindrical container 30 and a circulating piping 20 of a washing soln. is connected to the space between both inner and outer surfaces of the container 30 and the filter 32. The filter 32 is formed into a two-layered structure wherein filters having different properties are superposed on upon another and the outside thereof is set to a physical collection filter 34 and the inside thereof is set to an electrical collection filter 36. A DC power supply 38 is arranged outside the cylindrical container and a pair of the terminals thereof are connected to the electrical collection filter 36 and the cylindrical container 30 through respective wiring cables 40. At this time, potential different in polzarity from the zeta potential of the foreign matter varied by the pH value of the washing soln. is applied to the electrical collection filter 32 to collect the foreign matter in the washing soln.
申请公布号 JP2001017887(A) 申请公布日期 2001.01.23
申请号 JP19990191703 申请日期 1999.07.06
申请人 SEIKO EPSON CORP 发明人 YASHIMA KOJI
分类号 B03C5/00;H01L21/304;(IPC1-7):B03C5/00 主分类号 B03C5/00
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