发明名称 |
CHEMISORPTION SUBSTANCE FOR FORMING THIN FILM AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To provide a new chemisorption substance for forming a thin film, capable of forming a coating film of monomolecular layer by the chemical adsorption on a substrate surface, transparent and stable to the light of visible range, activated by ultraviolet rays and forming intermolecular crosslinks by ultraviolet irradiation. SOLUTION: The objective compound is expressed by formula X ((n) is 1-20; X is a halogen), e.g. the compound of formula II. The production process of the compound of formula I comprises e.g. the 1st step to perform aldol condensation reaction of (A) benzaldehyde with (B) 4-acetylbenzoic acid to obtain (C) a chalcone derivative of formula III having carbonyl group bonded to the 4'-site of the benzene ring of chalcone skeleton and the 2nd step to carry out the dehydrohalogenation reaction of (D) an alcohol having chalcone skeleton and derived from the component C with (E) a compound of the formula: SiX4 (X is a halogen) in an inert gas atmosphere to obtain the objective chalcone derivative having the characteristic group of formula IV and an O-SiX3 group.
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申请公布号 |
JP2001019696(A) |
申请公布日期 |
2001.01.23 |
申请号 |
JP19990190001 |
申请日期 |
1999.07.05 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OTAKE TADASHI;OGAWA KAZUFUMI;NOMURA YUKIO;TAKEBE NAOKO |
分类号 |
G02F1/1337;C07F7/04;(IPC1-7):C07F7/04;G02F1/133 |
主分类号 |
G02F1/1337 |
代理机构 |
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代理人 |
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地址 |
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