发明名称 Photosensitive composition
摘要 Disclosed is a positive photosensitive composition, comprising an alkali soluble resin having at least some or all of the alkali soluble groups protected by a substituent which can be decomposed by an acid, a compound which generates an acid upon irradiation with an actinic radiation, and a compound which generates water under action of an acid catalyst.
申请公布号 US6177229(B1) 申请公布日期 2001.01.23
申请号 US19990237659 申请日期 1999.01.27
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAITO SATOSHI;KIHARA NAOKO;USHIROGOUCHI TORU
分类号 G03F7/004;G03F7/039;(IPC1-7):G03C1/73 主分类号 G03F7/004
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