发明名称 METHOD AND APPARATUS FOR FORMING CHEMICAL SOLUTION FILM
摘要 PROBLEM TO BE SOLVED: To form a chemical soln. film to the surface of an object while suppressing the adhesion of foreign matter thereto. SOLUTION: A lacquer soln. 42 passes through the outer wall of the filter 54 put in a liquid tank 52 in a falling process to enter the filter and, since the foreign matter is contained in the lacquer soln. 42 and filtered off by the outer wall of the filter, foreign matter with a definite size or more incapable of passing through the outer wall of the filter does not enter the filter. Since a front plate 16 is immersed in the lacquer soln. 42 not substantially containing foreign matter entering the filter 54, that is, in a region isolated by the outer wall of the filter 54 to be prevented from the penetration of the foreign matter, the film of the lacquer soln. is formed on one surface 12 of the front plate by pulling out the front plate 16 from the lacquer soln. 42 in a pulling-out process without bonding foreign matter to one surface 12 of the front plate.
申请公布号 JP2001017899(A) 申请公布日期 2001.01.23
申请号 JP19990196300 申请日期 1999.07.09
申请人 NORITAKE CO LTD;NORITAKE DENSHI KOGYO KK 发明人 HIRAKAWA KOTA
分类号 H01J9/22;B05C3/02;B05D1/18;B05D7/00;(IPC1-7):B05C3/02 主分类号 H01J9/22
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