发明名称 Method of etching a substrate
摘要 A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to the etcher (10) so that the substrate (11) is suspended over the inner chamber (22). A recirculating system (29) is used to pass an etchant through a filter, into the inner chamber (22), across the substrate (11), into the collection chamber (17), and into a reservoir.
申请公布号 US6177354(B1) 申请公布日期 2001.01.23
申请号 US19990389640 申请日期 1999.09.03
申请人 MOTOROLA, INC. 发明人 MANGAT PAWITTER JIT SINGH;SEESE PHILIP ARMIN;DAUKSHER WILLIAM JOSEPH
分类号 C23F4/00;H01L21/00;H01L21/306;(IPC1-7):H01L21/302 主分类号 C23F4/00
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