发明名称 MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide the manufacturing apparatus of a semiconductor device which facilitates experimentally manufacturing work of the semiconductor device. SOLUTION: An operation panel is provided with an application switch 90 for applying a photoresist to a semiconductor wafer, an exposure switch 92 for aligning the photoresist and a developing switch 94 for developing the photoresist and is connected with a control unit 98. One or two continuing treatments among the three treatments of applying, exposing and developing of the photoresist can be executed selectively by operating these switches.
申请公布号 JP2001015417(A) 申请公布日期 2001.01.19
申请号 JP19990186632 申请日期 1999.06.30
申请人 SEIKO EPSON CORP 发明人 INABA MANABU
分类号 H01L21/30;G03F7/16;G03F7/30;H01L21/027 主分类号 H01L21/30
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