发明名称 DEFLECTING SYSTEM, CHARGED PARTICLE BEAM EXPOSING DEVICE USING IT, AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To bring a refrigerant into contact with an entire coil when the refrigerant is made to flow on a coil plate to improve temperature stability of the coil, by spirally forming a flat coil on at least one surface of two right and left surfaces of a plurality of flat coil plates fixed to a cylinder. SOLUTION: The left coil 14 spirally extends from a terminal 18A to the center on a left surface 12L of a substrate 12 and is wound to a terminal 18B of an inner pad 14P of the coil 14, and the terminal 18B reaches a right surface 12R through the substrate 12. Similarly, the right coil 16 spirally extends outward and reaches terminal 18C. The left and right coils 14, 16 are interconnected through the terminal 18B on both sides of the substrate 12. Refrigerant is made to flow through the entire coils, and the thin substrate 12 is made of hard quarts with low thermal expansion and the coils 14, 16 are adhered to this to suppress extension and contraction of the coil. Thus, thermal stability of the coils 14, 16 is secured.
申请公布号 JP2001015054(A) 申请公布日期 2001.01.19
申请号 JP20000169085 申请日期 2000.06.01
申请人 NIKON CORP 发明人 KENDALL RODNEY A
分类号 G03F7/20;H01J37/147;H01J37/305;H01J49/20;H01L21/027;(IPC1-7):H01J37/147 主分类号 G03F7/20
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