| 摘要 |
PROBLEM TO BE SOLVED: To improve the yield of a semiconductor element manufacturing process. SOLUTION: A manufacturing process controller is provided with an insulating film discriminating means 113, which discriminates the presence of an insulating film on the surface of a substrate, an in-insulating film impurity concentration extracting means 115 which extracts the concentration of an impurity contained in the insulating film on the surface of the substrate, and a diffusion parameter drawing means 116, which draws a diffusion parameter value constituting a diffusion equation as the function of the concentration of the impurity contained in the insulating film. The controller is also provided with an in- substrate impurity distribution extracting means 117, which extracts the information on the impurity distribution in the substrate by solving the diffusion equation, to which the diffusion parameter value is introduced.
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