| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photoresist composition excellent in shelf stability of a resist solution by incorporating a compound which generates an acid when irradiated with active light or the like, a resin which contains specified repeating units and is decomposed by the action of the acid to increase its alkali solubility and a specified mixed solvent. SOLUTION: The photoresist composition contains (a) a compound which generates an acid when irradiated with active light or the like, (b) a resin which contains repeating units each containing an alkali-soluble protected with a group containing an alicyclic hydrocarbon structure of formula I or the like and/or repeating units of formula II, formula III or the like and is decomposed by the action of the acid to increase its alkali solubility and (c) a mixed solvent containing propylene glycol monomethyl ether acetate or the like and ethyl lactate or the like. In the formula I, R11 is methyl, ethyl or the like and Z is an atomic group required to form an alicyclic hydrocarbon group together with C. In the formula II, R1 is H, a halogen or the like, X1 is a divalent combining group and Lc is lactone. |
