| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device by which the degree of the deterioration of a pattern imparting member (mask or the like) for giving a pattern which is to be transferred to a material to be exposed is easily and appropriately known and the quality control of the pattern imparting member is efficiently performed. SOLUTION: In this exposure method for transferring the pattern to the material to be exposed by exposure in pattern shape, the quality of the pattern imparting member for giving the pattern which is to be transferred is controlled based on the evaluation (for example, evaluation reference A) of the edge roughness of the pattern formed by exposure. In this exposure device for transferring the pattern to the material to be exposed through exposure in the pattern shape by using the pattern imparting member for giving the pattern which is to be transferred, the edge roughness of the pattern formed by the exposure is evaluated and the pattern imparting member replacement is performed based on the evaluation.</p> |
