CATOPTRIC ELEMENT AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To extremely lessen deformation due to thermal fluctuation even when X rays or extreme ultraviolet rays are radiated and prevent the intensity of irradiation of X rays or extreme ultraviolet rays from attenuating by providing a cooling means in a multilayer reflecting mirror that reflects X rays or extreme ultraviolet rays. SOLUTION: A catoptric element that reflects X rays or extreme ultraviolet rays is equipped with a substrate 1 where a reflection film can be formed over a larger area than a reflection region 2a, reflection films 2 which are deposited on the reflection region 2a and a domain 2b other than it on the substrate 1 and a cooling means 3 that is located on the reflection film 2 deposited on the domain 2b to cool the reflection film 2.