| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processor capable of uniformly coating all over the area of photosensitive material with processing and performing high-quality processing without irregular development solution in a case of processing the photosensitive material by using a small quantity of processing solution. SOLUTION: A developer coating mechanism 5 is provided with a developer supply tube 104 having plural discharge holes 105 bored at its lower part, a diffusion roller 101 and a diffusion plate 103 abutting on the roller 101 by which the developer supplied from the tube 104 is made to flow down at the lower end of the tube 104, a coating roller 100 rotating the developer flowing down from an opening part between the roller 101 and the plate 103 while abutting on a planographic printing plate M, and a backup roller 102 abutting on the roller 100. After the processing solution supplied from a processing solution supply part is diffused at two steps, the photosensitive material is coated with the processing solution by the coating member, so that the photosensitive material is uniformly coated with the processing solution even when a small quantity of the processing solution is applied to the photosensitive material. |
