发明名称 PROCESSING METHOD OF SUBSTRATE FOR PLASMA DISPLAY, SUBSTRATE FOR PLASMA DISPLAY, PLASMA DISPLAY PANEL AND PLASMA DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent unevenness on ribs as much as possible in a method for forming the ribs on a substrate for a plasma display by means of thermal processing using a laser beam. SOLUTION: First, an insulation layer 4 is formed by applying a thermoset insulation material having a small percentage of constriction to the surface of a substrate 3A for a back panel and by drying it. Next, a laser beam 5 having an irradiation diameter corresponding to a predetermined rib width is radiated to the insulation layer 4 at a predetermined rib interval while scanning it at a speed at which only the surface of the insulation layer 4 is thermally set, so that the upper part of a part to be formed into ribs is thermally set. Sand blasting 7 is applied to the surface of the insulation layer 4 so that non-thermoset parts 6 are removed, and the insulation layer is washed and dried. Finally, in order to strengthen the remaining non-thermoset parts 6 as the ribs including thermoset parts 18, uniform thermosetting is applied to all over the substrate 3A for a back panel, so that the ribs 1 are formed. Since only the surface of the insulation layer 4 is thus thermally set, unevenness is hardly produced on the ribs.
申请公布号 JP2001015014(A) 申请公布日期 2001.01.19
申请号 JP19990187519 申请日期 1999.07.01
申请人 MITSUBISHI ELECTRIC CORP 发明人 HAYASHI MASAHARU;KAMISAKI KATSUTO
分类号 H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;(IPC1-7):H01J9/02;H01J11/02 主分类号 H01J9/02
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