发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To determine whether foreign matter/defect is fatal or not during appearance inspection and to reflect the inspection result in a semiconductor device manufacturing process. SOLUTION: The appearance inspecting apparatus comprises a stage movable in both X and Y directions; a laser serving as a light source, a detector for detecting the scattered and diffracted light of a laser beam; a detected image comparison processing system 5 for receiving a signal from a chip for inspection which is assumed to have foreign matter/defect, and a signal from a chip for reference which is assumed to have no foreign matter/defect and comparing both receiving signals; a central processing system 9 for controlling movement of the stage and calculating the coordinates of the foreign matter/defect, to determine whether the foreign matter/defect is fatal or not; an inspecting apparatus displaying system 18 for displaying the result of the fatality determination; and an inspecting apparatus communication system 19 for transmitting data to an analyzer 50, which is an external device. As a result, it is determined whether or not the foreign matter/defect is fatal or not, and the result of the determination is reflected in a semiconductor manufacturing process.
申请公布号 JP2001015566(A) 申请公布日期 2001.01.19
申请号 JP19990182295 申请日期 1999.06.28
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 IKODA MASAMI;SUGIMOTO ARITOSHI;NAKAMURA HISATO
分类号 H01L21/66;G01N21/95;G01N21/956;(IPC1-7):H01L21/66 主分类号 H01L21/66
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