| 摘要 |
PROBLEM TO BE SOLVED: To obtain an antireflection film capable of preventing the deterioration of an image at the time of being formed on each of optical parts made of a resin and being used in a color separation optical system or a color synthesis optical system by specifying reflectance to light in at least a certain wavelength range in the visible light region except a prescribed range. SOLUTION: Plural thin films are laminated on a substrate made of a resin such as acrylic resin or polycarbonate, a silicon oxide layer is formed as an underlayer as the thin film closest to the substrate and the reflectance of the resulting antireflection film to light in at least a certain wavelength range in the visible light region except a prescribed 100 nm range is adjusted to >=3% to obtain the objective antireflection film. A beam of light incident on optical parts made of the resin and disposed on light paths of one or more among red light, green light and blue light before synthesis or after separation passes the antireflection film disposed on each of the optical parts. |
