CONTACT PROBE AND POLISHING METHOD FOR CONTACT PIN

摘要

PROBLEM TO BE SOLVED: To reduce and stabilize contact resistance of a contact pin to a pad. SOLUTION: In a contact pin 32a of this contact probe 30, a smooth face 43 approaching an upper face 40 as it goes to the tip of the contact pin 32a is formed on the tip side of a lower face 41 by polishing to allow inclination to the lower face 41. The smooth face 43 is formed over a length of 50-150μm along the longitudinal direction from the tip of the contact pin 32a. For the purpose of formation of the smooth face 43, the contact pin 32a is polished with the contact pin 32a contacted with a polishing face (47a) at a polishing angleβsmaller than a contact angleθto a pad (18a).