PLASMA PROCESSING APPARATUS

摘要

The present invention provides a process apparatus 100 including an airtight process vessel 102, an exhaust system 128 for exhausting gas from the process vessel 102, and a baffle plate 120 for partitioning the process vessel 102 into a process chamber 122 for processing an object and an exhaust passage 124 communicating with the exhaust system 128, the baffle plate 120 has a plurality of slits 120a through which the process chamber 122 and the exhaust passage 124 communicate with each other, and each of the slits 120a has a tapered surface 132 on an inner surface toward the process chamber, the tapered surface corresponding to not less than 1/4 of a depth of the slit.